“Convergenta tehnologiilor si

dezvoltarea unui nou tip de infrastructuri”

Dan Dascalu, director general, INCD-Microtehnologie

Convergenta stiintelor si a tehnologiilor in PC7

• Convergenta stiintelor? De fapt o cercetare multidisciplinara. Exista de multa vreme biofizica, biochimie, chimie fizica etc.

• Convergenta tehnologiilor: apar atunci cand anumite tehnologii patrund intr-un nou domeniu de aplicatii, de fapt un domeniu care isi are deja tehnologiile proprii.

• Convergenta tehnologiilor in PC7. – Micro-nano-bio-info sau micro-nano-bio-cogno.

Suprapuneri intre tema ICT (TIC) si NMP, dar si cu tema Health (Sanatate). Aceasta arata interesul exceptional pentru anumite subdomenii.

M-N-O-B: Micro-Nano-Opto-BioN-M-B: Nano-Micro-BioM-N-O: Micro-Nano-OptoB-O-N: Bio-Opto-NanoM-B-O: Micro-Bio-Opto

Input MINOS DATABASESMINOS selection of topics

New!

• Micro-Opto– RF (Microwave, Millimeter Wave)– Opto (Photonics)

• Two laboratories from IMT (former centres of excellence in RELANSIN and MATNANTECH, respectively)– Now designed as a common structure: a

Centre of excellence of EU in RF and Opto Centre of excellence of EU in RF and Opto MEMS (MIMOMEMS).MEMS (MIMOMEMS).

MIMOMEMS

A new project was invited for negotiation in Brussels

European Centre of Excellence in Microwave, Millimetre Wave and Optical Devices, based on Micro-Electro-Mechanical Systems for Advanced Communication Systems and Sensors – MIMOMEMS

►Capacities - Part 4 - Research Potential. Activity: 4.1.Unlocking and developing the research potential in the EU´s convergence regions and

outermost regions (REGPOT-2007-1)►Cooperation – Theme 3 - Information & Communication Technologies. Challenge 3: Components, systems, engineering

● The overall aim of the MIMOMEMS project is to bring the research activity in RF and Optical-MEMS at the National Institute for R&D in Microtechnologies (IMT) to the highest European level and create a European Centre of Excellence in Microwave, Millimeter Wave and Optical Devices, based on Micro-Electro-Mechanical Systems (MEMS) for Advanced Communication Systems and Sensors.

● The Centre of Excellence will be created by developing IMT- Bucharest’s existing scientific expertise and capacities and collaborating closely with specialist research groups at LAAS-CNRS in Toulouse and FORTH-IESL-MRG in Heraklion.

► Vector Network Analyzer (VNA) up to 110 GHz and on wafer measurement facilities

in order to upgrade the 0.8-65 GHz existing on wafer characterization system

► Frequency synthesiser up to 65GHz

► Au plating facility for semiconductor wafers

►White light interferometer- optical profiling system for research applications

►Near field scanning optical microscope (SNOM)

Equipments to be acquired in the MIMOMEMS project

MIMOMEMS

MIMOMEMS

►White light interferometer- optical profiling system for research applications

A Sub-nanometer resolutionNon-contact measurements by optical interferometry with vertical resolution down to 0.1 nmFast resultsFull field 3D measurements in just a few secondsVersatileReflectivity 1% to 100% : Transparent films (Glass), Silicon, MetalNon-contact measurementsAll measurements are non destructive, repeatable and require no sample preparationSystem stability and linearityMeasurement are related to wavelength. Highly stable metrology thanks to its design including a capacitive sensor feedback loop in Heraklion. .

Examples of different investigations- Fogale – Nanotech web page

O perspectiva mai larga

• Convergenta tehnologiilor– Nu este ceva nou (v. exemple mai departe)– Ridica dificultati suplimentare– Poate duce la convergenta industriilor (v.

exemple mai departe)– Un cocktail exploziv: micro-nano-bio– In general – noile materiale si tehnologii pot

afecta industriile traditionale

Convergenta in “tehnologia electronica”• Ultimul deceniu al secolului trecut: convergenta

intre industria comunicatiilor si industria calculatoarelor (de fapt tehnica calculatoarelor digitale (cifrice, numerice) a patruns in tehnica comunicatiilor (initial analogica).

• Astazi avem TIC = tehnologia informatiei si a comunicatiilor (si industria TIC), dar are loc un alt fenomen: convergenta TIC cu “industria media”.

• Un contraexemplu: TIC se aplica si in constructia automobilului (gasim produse TIC in automobil, pe liniile de fabricatie), dar aceasta nu inseamna convergenta tehnologiilor.

Care sunt implicatiile? • Potentialul este enorm, dar apar si o serie de

dificultati• Necesitatea unei formatii interdisciplinare a

specialistilor (de ex. pentru proiectarea unui microsistem electro-mecanic, MEMS).

• Abordari diferite (paradigme diferite) care ingreuneaza mult colaborarea. Colective “mixte” de cercetare – esentiale pentru formare.

• Sunt interesate firme de diverse “calibre”, dar ele nu au toate mijloacele necesare (expertiza, dotari) pentru a aborda produse noi cu tehnologii avansate, neconventionale (v. platforma MINAM).

• Micro-nanofabricatie: accesul firmelor! ... Cel mai practic “One-stop shop”?

A new concept for a new era!

• An “open” lab is containing various (up-to date) equipments. An equipment may incorporate a immense amount of new knowledge; at the same time it may be seen as a platform for creating, disseminating and using this knowledge (most of it as “know-how”)– Open to researchers from other labs– Open to researchers from other organizations

• Laboratory open for companies• Loboratory open for education

– The so-called “knowledge triangle”: research, education, innovation

► RTN-NANOEL: Romanian Technological Network for integration in the European Platform for NANOELectronics (ENIAC) (2006-2008)

► NANOSCALE-CONV: Network of scientific services for nano-scale structuring and characterization, with applications in the development of convergent technologies (2005-2008)

IMT- Bucharest is coordianting 2 Romanian innovative networks acting in nanooelectronic and nanotechnology area, developing andvanced research, providing services for structuring and characterization at nanoscale and “ hands on training” activities

The equipments acquisitioned by this networks contributed to the development of a new lab in IMT- Bucharest:

NANOSCALE-LAB

NANOSCALE-LAB

These Networks, for structuring, scientific research services and characterization at nano-scale bring together well known research institutes and academia, spread all over the country, using in common infrastructures, characterization and manufacturing equipments and complementary skills.

The new structuring and characterization facilities were created, to promote the advanced of the fundamental nano-knowledge, to strength the scientific, technological and training excellence.

•This laboratory will become, in fact, a “Centre of nanoscale structuring and characterization”, a “conglomerate” of laboratories with equipments financed from various sources.

.

Specific instruments and equipment available in the lab:

►Atomic Force Microscope, noncommercial model developed by Twente University (the first AFM in Romania- 1994)

• Atomic Force Microscopy (AFM) performs high resolution surface morphology investigations• Main application consists in 3D surface topography recording and measurement (waviness, roughness, step heights, grains, particles etc)• It admits nearly all solid samples, both conductive and nonconductive

Professional software for image processing  (SPIPTM – Image Metrology)        

NANOSCALE-LAB

  Characteristics

Maximum scan area: 20m x 20m x, y scanner resolution: 5 nmz resolution: 2 nm

NANOSCALE-LAB

AFM 2D and 3D images of a silicon diffrractive structure. Scan area : 20m x 20m

Arsenium-dopped single crystal Si surface 20m x 20m scan area; RMS roughness Sq = 37,3 nm

1m x 1m AFM scan of titanium oxide thin film deposited by magnetron sputtering onto silicon.Applications to optical thin films

A new

►Nanolithography Equipment composed of a SEM and EBL

●Scanning Electron Microscopy TESCAN VEGA 5136 LMResolution: 3 nm @ 30 kV, accelerating voltage 200V-30 kV, electron gun source: tungsten

filament, magnification : 13X – 1.000.000X, detectors: SE, BSE, LVSTD.

● PG Elphy Plus from RAITH6 MHz high-speed pattern generation hardware

       

NANOSCALE-LAB

Examples of different investigations and tests using EB Nanolitography

Test of nanolitography: Configurations in PMMA resist for manufacturing subwavelength photonic devices (subwavelength hole arrays for photonic cristals) realised for Photonic Lab of IMT

Bucharest

NANOSCALE-LAB

Examples of different investigations and tests using EB Nanolitography

Test of nanolitography: Configurations in PMMA resist for manufacturing Fresnel lens, realised for Photonic Lab of IMT

Bucharest

NANOSCALE-LAB

The design transfer on the wafer was performed using a Scanning Electron Microscope equipped with an EBL by direct writing. The result of this process, the nano patterning in PMMA resist

300nm wide and 200 nm high metallic TiAu fingers obtained by lift off technique

SAW structures with operating frequencies in the GHz range. The experiments were developed on AlN and GaN thin films with nano-metric lines for the IDT

NANOSCALE-LAB

Two experimental SAW structures with the two IDTs placed “face to face”

Examples TiAu nanostructures obtained by EBL and lift off process

Nanodots (Au on silicon) obtained using EBL and lift-off techniques

50nm diameter nanodots (Au on glass) for nanophotonics applications

NANOSCALE-LAB

Examples of nanostructuring using EB Nanolitography

Example of mix and match lithography: optical lithography and EBL

.

NANOSCALE-LAB

Examples of nanostructuring using EB Nanolitography

Structures obtained by classical optical

lithography

Structures obtained by EBL lithography

Details of the EBL structure

New Equipments in the NANOSCALE- LAB

► SPM - Multifunctional Scanning Probe Microscope NTEGRA Aura  (NT-MDT) has been recently installed

It allows operation in air, liquids, low vacuum (10-2 torr) and controlled gaseous atmosphere. • Vacuum operation optimises the resonance frequency or "Q factor" of the cantilever, producing better images for semi-contact AFM modes and increased sensitivity for non-contact modes such as MFM (magnetic force microscopy) and EFM (electrostatic force microscopy).

• Temperature control of the sample is possible up to 200°C. The special Thermohead™ provides extremely low thermal drift , which allows long-term measurements to be done in pre-defined points on the specimen surface.

NANOSCALE-LAB

Characteristics:

►Maximum scan range: : 100x100x10 µm (up to 150x150x15 µm in DualScan™ mode)

► Min Control Resolution XY: 0.0004 nm

► x, y: Nonlinearity, with closed-loop sensors 0.15%

► z: Noise level, with sensors: 0.04 nm (typically)

► Thermal stability to ± 0.005°C (typically).

NANOSCALE-LAB

► Operation modes in air: STM Scanning Tunneling Microscopy/ STS Scanning Tunneling Spectroscopy/contact AFM/ LFM/ ResonantMode (semicontact + noncontact AFM)/ Phase Imaging/ Force Modulation (viscoelasticity)/ MFM/ EFM/ Adhesion Force Imaging/AFM Lithography-Force/Spreading Resistance Imaging (SRI)/AFM Lithography-Voltage/Scanning Capacitance Imaging (SCI)/Scanning Kelvin probe microscopy(SKM)

Equipments which will be available very soon!

► RAITH e-LiNE Nanoengineering System and ultra high resolution electron beam lithography

● Field emission emitter          ●   Laser interferometer stage with 100 mm by 100 mm travel range    and  2 nm resolution achieved by closed-loop piezo-positioning          ● 10 MHz DSP -controlled digital pattern generator

NANOSCALE-LAB

Equipments which will be available soon:

► EDX- Energy dispersive X-ray microanalysis in SEM- system QUANTAX ( Bruker AXS)- liquid nitrogen free XFlash® silicon drift detector, 135eV resolution, boron detection.

► NANOIDENTER equipment for nanomechanical testing (mainly based on nanoindentation), for characterization of hardness, modulus, elasticity and viscoelasticity, wear etc at nanoscale.

• Nanomechanical testing provides a way to analyze materials at very small scales and very high resolution• This opens the door for a better understanding of materials and thin films and yields quantitative information for research, development and production

NANOSCALE-LAB

► HIGH RESOLUTION FEG-SEMUltra high resolution imaging at low kV •Ideal for precise boundary, feature, and particle measurements •High efficiency EsB detector for compositional information •High efficiency In-lens SE detector for high contrast surface imaging •BSE imaging at very short working distances - 1mm WD •Ultra stable high current mode for X-ray analysis and EBSD applications - 20 nA / 0.2%/h •Large five axes motorised eucentric stage •Easy operation through Windows® XP based SmartSEM™ control software Resolution 1.0 nm @ 15 kV

1.7 nm @ 1 kV4.0 nm @ 0.1kV

Magnification 12 - 900,000x in SE mode100 - 900,000x with EsB detector

Emitter Thermal field emission type, stability >0.2%/h

Acceleration Voltage

0.1 - 30 kV

Probe Current

4 pA - 10 nA (20 nA optional)

Standard Detectors

EsB detector with filtering gridFiltering grid voltage 0 - 1500 VHigh efficiency In-lens SE detectorEverhart-Thornley Secondary Electron Detector

NANOSCALE-LAB

Another example• NanoBioLab

– Experimenting micro/nano structures (microarrays, lab-on-chip-structures etc.) used for bio-medical applications

– Clean room environment – Created by the RO-NANOMED network (open to the

other partners in networks and also to the companies)– Extended by using other projects– Basis of a “Centre of micro- and nantechnologies for

bio-medical applications”, inside IMT, open to cooperation

The laboratory is installed the technological area of IMT-Bucharest, in the “Scientific and Technological Park for Micro and Nanotechnologies” MINATECH-RO.

NANOBIOLAB is devoted to technological research related to new materials, structures, particles, devices etc., involving biological materials.

The activities developed in NANOBIOLAB are mainly dedicated to “microarray technologies”, with applications in genomics and proteomics, using new specific equipments:

Omni Grid Micro Plotter GeneTAC UC4 Scanner.

Omni Grid Micro Plotter can dip into a source plate and spot a given volume of sample solution onto a solid surface (e.g. glass slide, silicon substrate) → up to 200 consistent spots can be produced from a single dip. • The print speed is 10,000 spots/11 slides in less than 3.5 hr. • A Control Computer assures the utilization interface .

A vacuum wash station ensures active washing in between sample transfers while humidity control minimizes evaporation of precious sample.

“UC4 Microarray Scanner” is the pair of the nano-plotter, used for reading the chips, for DNA detecting and deposition → it offers high resolution scanning across the entire surface of standard microarray substrates.The system has two-color lasers - green (532nm) and red (635nm) - coupled with high performance optics optimized to maximize collection of fluorescence signal while minimizing the damage caused by photobleaching. The scanner includes: → hardware;

→ powerful and easy-to-use microarray analysis software for fast and reliable imaging, collection and storage of very large data sets and consolidates these data with experimental information.

NANOBIOLABNANOBIOLAB

Development of NANOBIOLAB

New equipments for nano-biomaterials characterisation:

VersaSTAT3 for:

• electrochemical impedance spectroscopy

(applications in materials selection and performance

evaluation, to detect interfacial properties of catalysts

and to determine the biological molecular such as

protein and DNA or antigen-antibody interactions );

• corrosion analysis (for example to study the

corrosion susceptibility of metallic biomedical

implant).

• (bio)sensor development: potentiometric sensors

(such as ion-selective electrodes) and amperometric

sensors (gas sensors, and chemically modified

electrodes)

Applications:

• imaging of electroactive surfaces;

• local pH gradients;

• study of enzyme activity in biological membranes

EIProScan – Electrochemical Probe Scanner

for:

→ surface analysis:

scanning electrochemical

microscopy (SECM)

→ surface structuring: local

deposition of metal or

conductive polymers in the

micrometer/nanometer

scale

Recent results:

Surface Modification for Protein Attachment in Microarray Technology

0.0 0.2 0.4 0.6 0.8 1.00

2000

4000

6000

8000

10000after spotingafter 20min washingafter 40min washing

Sp

ot

inte

nsi

ty C

Y3

Concetration

Spot intensity as function of concentration

for silicon slides functionnalized with gold

after different time of washing

Studies of different chemical substrate (glass slides coated with APS, NHS, ALD, poli-L-lysine, gold and silicon

slides coated with gold) printed with BSA of different concentrations and marked with CY3 were performed.

After printing, the slides were washed with PBS (pH=7,4) after 20, 40 and 60 minutes. Before and after

washing the intensity of the spots by scanning the slides and the UV – spectra of the washing residues were

analyzed.

NANOBIOLAB is a platform of interaction open to all RO-NANOMED participants, but also for cooperation with private companies, universities and other research institutes from Romania and abroad.

A close cooperation is developed with two

Romanian companies DDS Diagnostic SRL and

Dexter Com SRL

New activities are foreseen in partnership within the European project

“INTEGRAMplus: Integrated MNT platforms and services – Service

Action”, IP coordinated by QinetiQ Ltd, UK.

New PN II -PC project: 2007 - 2010

Multi Alergen Biochip realised by MicroArray

technology

General objectives

O1. Investigation and studying of the specific processes for technological development of a microarray biochip

containing multiallergens for the rapid and noninvasive detection for the allergies with high frequencies in Romania;

O2. Investigation of the biohibridic interfaces, with accent on proteins (allergens) on silicon substrate

Partners:

P1 University of Farmacy and Medicine “ Carol Davila

P2 -University Bucuresti

P3 – Telemedica SA

P 4- DDS Diagnostic SRL

New PN II – IDEI project: 2007 – 2010

Study of silicon-protein type biohybride

nanostructured surfaces with applications in

bio(nano)senzingObjective 1. Biofunctionalisation of the solid support (Si, nanocrystalline silicon, Au/Si, Au/PS)

Objective 2. Protein biodetection

Secundary objectives:

- increase the knowledge for the development of

microdevices with supra-molecular architectures;

- optimisation of the Si-biomolecule interface in

correlation with specific applications;

- the establishment of the input parameters for

design a testing platform on a Si chip for biohybrid

interfaces for electrical and optical measurements

in real time.

New PN II project: 2007 - 2010

Silicon based multifunctional nanoparticles for cancer therapy

The aim:

- development of silicon based nanostructured systems for

vectorisation and controled release of the biological active substances

of therapeutic interest

Impact: The devices which lead the drugs directly to the proximity of affected organ

and release them as prescribed doses will improve the medical treatment.

→ A particular effect will have on cancer treatment, because silicon, in nanostructured

form, allows the carrying out of cytostatic drugs as well as radioactive ions, and offers, in

this simple mode, the possibility of a complete treatment with minimum effort and

maximum benefit – the frequently negative secondary effects from classical therapy.

iron oxides

(Super Paramagnetic Iron Oxide

Nanosized Particles -SPION)

These systems will consists of superparamagnetic microparticules

nanostructured silicon carriering

drugs integrated in an organic matrix

Partners:

• National Institute for Biological Science;

• Institute of Oncology

Recent results:Resorbable porous silicon nanocomposite reservoirs for mineral or drug delivery

Samples with Fe / PS / Si – n:

plan view and cross section of spin-on of a mixing etoxyetanol /

Fe(NO3)3

(b)(a)

Samples with Ag / PS / Si – n:

plan view and cross section

Nanocomposite silicon based membranes for microdevices

Two types of Si membranes were designed and fabricated:

1. suspended at the middle Si wafer, in depth; 2. integrated on the Si wafer face

PA2, x 100

~ 30 μm

~ 25 μm

Depending of PS membrane morphology specific applications were

developed Si nanostructured membrane can be the required elements to

assure:

proton conduction for

miniaturised fuel cell

filter and dosing layer in

controlled drug delivery device dielectric / sensing layer in

capacitive humidity / gas sensor

Porosification process: - electrochemical

etching in HF based solution

The modifications of process parameters allow us to

obtain porous silicon layers with different dimensions of

pores / Si fibrils

Recent results:

Department for converging technologiesDepartment for converging technologies

• MIMOMEMS– Centre for RF and Opto MEMS

(European Centre of Excellence)

• NanoScaleLab– Centre for structuring and characterization at

the nano-scale

• NanoBioLab– Centre for biomedical applications of micro-

and nanotechnologies

Contributii din IMT-Microtehnologie

• Raluca Muller, director de departament (ralucam@imt.ro)

• Adrian Dinescu, sef laborator (adriand@imt.ro)

• Raluca Gavrila (ralucag@imt.ro)

• Mihaela Miu (mihaelam@imt.ro)

Multumim pentru atentie!

• Contact: Dan Dascalu (dascalu@imt.ro)